发明名称 パターン形成方法、及び電子デバイスの製造方法
摘要 There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.
申请公布号 JP6031369(B2) 申请公布日期 2016.11.24
申请号 JP20130017949 申请日期 2013.01.31
申请人 富士フイルム株式会社 发明人 山口 修平;冨賀 敬充;吉野 文博;古谷 創;白川 三千紘;藤田 光宏
分类号 G03F7/004;G03F7/038;G03F7/039;G03F7/32 主分类号 G03F7/004
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