| 摘要 |
PROBLEM TO BE SOLVED: To provide an alignment method with which alignment can be highly accurately performed at high speed. SOLUTION: In a pattern inspection of an Nth substrate to be inspected, other than first one, among a plurality of substrates to be inspected, an N-1th alignment position O3, O4 is detected in step S30. Alignment imaging of a substrate to be inspected is performed in step S31. An alignment position O1, O2 is acquired from an alignment image resulting from alignment imaging in step S32. Prealignment is performed, based on the alignment position O1, O2 in step S33. An expansion/contraction scale of a master image relative to an inspection substrate is redetermined using the alignment position O1, O2, and the alignment position O3, O4 of an inspected substrate in step S34. An object image is then acquired after alignment, and a comparative inspection is performed using the relevant object image and the master image after expansion/contraction. COPYRIGHT: (C)2007,JPO&INPIT
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