| 摘要 |
A method of producing a Fresnel zone plate (15) comprising:
making available a substrate (1, 4, 7) which is rotationally symmetrical with respect to its center axis (1a, 4a, 7a);applying layers (2a-d; 5a-d; 8a-d; 11) following in succession by means of an atomic layer deposition (ALD) method to faces (1b-c; 4b-c; 7b-c) of the substrate (1, 4, 7) without rotation of the substrate (1, 4, 7) in order to form a coated substrate, andsevering (3a, b; 6a, b; 9a, b) at least one slice (13) from the coated substrate (1, 4, 7), by the coated substrate (1, 4, 7) being divided at least once at a right angle to the center axis (1a, 4a, 7a). |
| 主权项 |
1. A method of producing a Fresnel zone plate, virtually without limitation of an aspect ratio, comprising:
making available a substrate of glass which is rotationally symmetrical with respect to its centre axis; applying layers following in succession by means of an atomic layer deposition (ALD) method to faces of the substrate without rotation of the substrate at a thickness, wherein the thickness of each individual layer, as applied, is identical to a thickness of a corresponding zone of the zone pate in order to form a coated substrate; and severing at least one slice from the coated substrate, by the coated substrate being divided at least once at a right angle to the centre axis. |
