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发明名称
Verfahren und Vorrichtung zur Behandlung eines Photoresists
摘要
申请公布号
DE69713232(D1)
申请公布日期
2002.07.18
申请号
DE19976013232
申请日期
1997.09.12
申请人
TOKYO ELECTRON LTD., TOKIO/TOKYO
发明人
KIBA, YUKIO;SEMBA, NORIO;HASEBE, KEIZO
分类号
B05D1/00;B05D3/00;G03F7/16;G03F7/30;(IPC1-7):G03F7/16
主分类号
B05D1/00
代理机构
代理人
主权项
地址
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