| 发明名称 |
PHASE SHIFT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR FORMING MICRO PATTERN |
| 摘要 |
A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern. |
| 申请公布号 |
US2016170294(A1) |
申请公布日期 |
2016.06.16 |
| 申请号 |
US201514691530 |
申请日期 |
2015.04.20 |
| 申请人 |
Samsung Display Co., Ltd. |
发明人 |
SON Yong;Kang Min;Kim Bong Yeon;Lee Hyun Joo;Ju Jin Ho |
| 分类号 |
G03F1/26;G03F7/20;G03F7/40;G03F1/76 |
主分类号 |
G03F1/26 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A phase shift mask, comprising:
a transparent substrate; a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate; and a metal coating layer arranged on at least a part of a surface of the phase shift pattern. |
| 地址 |
Yongin-city KR |
