| 发明名称 |
RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER |
| 摘要 |
A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R1 to R4 has the fluorine atom or a group including the fluorine atom. R5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).; |
| 申请公布号 |
US2016185999(A1) |
申请公布日期 |
2016.06.30 |
| 申请号 |
US201615066436 |
申请日期 |
2016.03.10 |
| 申请人 |
JSR CORPORATION |
发明人 |
NAMAI Hayato |
| 分类号 |
C09D133/14;C09D133/10;G03F7/038;C08F216/16;G03F7/20;G03F7/32;C08F220/68;C08F220/28;G03F7/11;C09D129/10 |
主分类号 |
C09D133/14 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A resin composition comprising:
a polymer comprising a structural unit that comprises a group represented by formula (1); and a solvent, wherein, in the formula (1), R1 to R4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R1 to R4 represents the fluorine atom or a group comprising the fluorine atom; R5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms; and * denotes a binding site to other moiety of the structural unit. |
| 地址 |
Tokyo JP |
