A TEST PATTERN OF A SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

摘要

PURPOSE: A test pattern of a semiconductor device and method for manufacturing the same are provided to detect a contact bridge by using a first contact and a second contact. CONSTITUTION: In a test pattern of a semiconductor device and method for manufacturing the same. A plurality of active areas(102A~102C) are parallel with a semiconductor substrate. A plurality of gate lines are formed on the semiconductor substrate in a plurality of active areas into a perpendicular direction. A plurality of contacts(108A) are formed on a plurality of active areas between a plurality of gate lines. A first dummy contact(108B) is formed in an upper part of odd-numbered active areas. The second dummy contact(108C) is formed in a lower part of even-numbered active area.