| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a foreign matter detection method which enables the detection of micro foreign matters and analyzing components in the same substrate. Ž<P>SOLUTION: A foreign matter detection apparatus 10, provided with an optical foreign matter inspection device 13, an electron beam irradiation device 14, a steam supply unit 15, and a pressure control valve 17 forms dews of moisture selectively on particles P by controlling boh the temperature of a wafer W and steam pressure in the atmosphere surrounding the surface of the wafer W, generates an ice crystal T from the moisture of the dews and makes it grow by controlling the steam pressure in such a way as not to exceed a saturation vapor pressure curve in the case where the particles have not adhered to the surface of the wafer as lowering the temperature of the wafer W, optically inspects the surface of the wafer W, specifies the position of a particle P to be inspected, removes the ice crystal T by evaporation, and analyzes the components of a specified particle P through the use of electron beams. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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