| 发明名称 |
A MANUFATORING METHOD OF HOT PLATE FOR TFT-LCD AND SEMICONDUCTOR DEVICE |
| 摘要 |
A method for manufacturing a hot plate for TFT(Thin Film Transistor)-LCD(Liquid Crystal Display), semiconductor and OLED(Organic Light Emitting Diode) manufacturing equipment is provided to restrain the gas leak by forming a hot plate, a sheath heater, and a sealing cap using the same aluminium or aluminium alloy materials. A hot plate body is made of aluminium or aluminium alloy materials. A sheath heater(20) and a temperature detecting sensor are buried at a bottom surface of the hot plate body. The sheath heater and the temperature detecting sensor are made of the same aluminium or aluminium alloy materials as those of the hot plate body. The aluminium or aluminium alloy materials are capable of being welded.
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| 申请公布号 |
KR20070001036(A) |
申请公布日期 |
2007.01.03 |
| 申请号 |
KR20060123996 |
申请日期 |
2006.12.07 |
| 申请人 |
POINT ENGINEERING CO., LTD. |
发明人 |
AN, BUM MO |
| 分类号 |
H01L21/02;H01L21/683;H01L21/687 |
主分类号 |
H01L21/02 |
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