发明名称 RESIN FILM FOR IMPROVING RESISTANCE
摘要 PROBLEM TO BE SOLVED: To provide an inexpensively and safely produceable resin film for improving resistance, having the resistances such as outdoor weather resistance and chemical resistance equal to that obtained by using a conventional photocurable resin coating material. SOLUTION: The resin film for improving the resistance is obtained by coating a visible light-curable silica-polysiloxane coating composition containing 0.1-15 pts.wt. photopolymerization initiator having an excitation wavelength longer than 380 nm wavelength in the visible light range as a photopolymerization initiator based on 100 pts.wt. silica-silicone oligomer having an acryloyl group and a silanol group at both terminals of the molecule, and containing 20-80 pts.wt. silica fine particles bonded to the silanol group by a condensation reaction. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009046526(A) 申请公布日期 2009.03.05
申请号 JP20070211086 申请日期 2007.08.13
申请人 IIDA SHIGEKI;NOVOMATRIX PTE LTD 发明人 IIDA SHIGEKI
分类号 C08J7/04;B05D7/04;B05D7/24;C08F299/08;C09D4/02;C09D5/00;C09D7/12;C09D167/07;C09D175/16;C09D183/07 主分类号 C08J7/04
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