MULTIPLE ELECTRODE SUBSTRATE SUPPORT ASSEMBLY AND PHASE CONTROL SYSTEM

摘要

Implementations described herein provide a substrate support assembly which enables tuning of a plasma within a plasma chamber. In one embodiment, a method for tuning a plasma in a chamber is provided. The method includes providing a first radio frequency power and a direct current power to a first electrode in a substrate support assembly, providing a second radio frequency power to a second electrode in the substrate support assembly at a different location than the first electrode, monitoring parameters of the first and second radio frequency power, and adjusting one or both of the first and second radio frequency power based on the monitored parameters.

主权项

1. A method for tuning a plasma in a chamber, the method comprising:
providing a first radio frequency power and a direct current power to a first electrode embedded in a substrate support assembly adjacent to a substrate support surface of the substrate support assembly; providing a second radio frequency power to a second electrode in the substrate support assembly at a location below the first electrode; monitoring parameters of the first and second radio frequency power; and adjusting one or both of the first and second radio frequency power based on the monitored parameters.