发明名称 |
Ion-nitriding process |
摘要 |
Disclosed is an improved ion-nitriding process comprising ion-nitriding a workpiece at a high voltage level of glow discharge in a gas atmosphere resulting from the introduction of a gas mixture containing a specific amount of ammonia into a nitriding reactor, and then, further ion-nitriding the same workpiece at a lower voltage level of glow discharge in a gas atmosphere resulting from the introduction of a gas mixture not containing ammonia into the reactor.
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申请公布号 |
US4309227(A) |
申请公布日期 |
1982.01.05 |
申请号 |
US19790057008 |
申请日期 |
1979.07.12 |
申请人 |
KAWASAKI JUKOGYO KABUSHIKI KAISHA |
发明人 |
KAJIKAWA, TAKASHI;MAKIMURA, MINORU;KUNISE, SATORU;FURUITSU, SATOSHI |
分类号 |
C23C8/36;C23C8/38;(IPC1-7):C21D1/48 |
主分类号 |
C23C8/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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