发明名称 Ion-nitriding process
摘要 Disclosed is an improved ion-nitriding process comprising ion-nitriding a workpiece at a high voltage level of glow discharge in a gas atmosphere resulting from the introduction of a gas mixture containing a specific amount of ammonia into a nitriding reactor, and then, further ion-nitriding the same workpiece at a lower voltage level of glow discharge in a gas atmosphere resulting from the introduction of a gas mixture not containing ammonia into the reactor.
申请公布号 US4309227(A) 申请公布日期 1982.01.05
申请号 US19790057008 申请日期 1979.07.12
申请人 KAWASAKI JUKOGYO KABUSHIKI KAISHA 发明人 KAJIKAWA, TAKASHI;MAKIMURA, MINORU;KUNISE, SATORU;FURUITSU, SATOSHI
分类号 C23C8/36;C23C8/38;(IPC1-7):C21D1/48 主分类号 C23C8/36
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