发明名称 Semiconductor doping process
摘要 A method for making a semiconductor device, such as a power-MOS transistor, wherein dopant is introduced into the structure underlying a lead contact pad to create a conducting subregion which minimizes electrical conductive breakdown.
申请公布号 US4766094(A) 申请公布日期 1988.08.23
申请号 US19860842778 申请日期 1986.03.21
申请人 HOLLINGER, THEODORE G. 发明人 HOLLINGER, THEODORE G.
分类号 H01L21/225;H01L21/285;H01L21/336;H01L29/06;H01L29/423;(IPC1-7):H01L21/385 主分类号 H01L21/225
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