发明名称 METHOD OF DETERMINING A MEASUREMENT SUBSET OF METROLOGY POINTS ON A SUBSTRATE, ASSOCIATED APPARATUS AND COMPUTER PROGRAM
摘要 A method of determining a measurement subset of metrology point locations which includes a subset of potential metrology point locations on a substrate. The method including identifying a plurality of candidate metrology point locations from the potential metrology point locations. A change in the level of informativity imparted by the measurement subset of metrology point locations which is attributable to the inclusion of that candidate metrology point location into the measurement subset of metrology point locations is evaluated for each of the candidate metrology point locations. The candidate metrology point locations which have the greatest increase in the level of informativity attributed thereto are selected for inclusion into the measurement subset of metrology point locations.
申请公布号 US2016334717(A1) 申请公布日期 2016.11.17
申请号 US201415111763 申请日期 2014.11.04
申请人 ASML NETHERLANDS B.V. 发明人 WILDENBERG Jochem Sebastiaan;MOS Everhardus Cornelis
分类号 G03F7/20;G01B11/27 主分类号 G03F7/20
代理机构 代理人
主权项 1. A method of determining a measurement subset of metrology point locations, the measurement subset comprising a subset of potential metrology point locations on a substrate, and the method comprising: identifying a plurality of candidate metrology point locations from the potential metrology point locations; evaluating for each of the candidate metrology point locations, a change in the level of informativity imparted by the measurement subset of metrology point locations which is attributable to the inclusion of that candidate metrology point location into the measurement subset of metrology point locations; and selecting for inclusion into the measurement subset of metrology point locations, those candidate metrology point locations which have the greatest increase in the level of informativity attributed thereto.
地址 Veldhoven NL