发明名称 FILM FLATTENING APPARATUS AND EXPOSURE SYSTEM USING IT
摘要 <p>PURPOSE: To place a film used for evaluating a state of exposure flat on a table where a work is mounted so as to evaluate a state of exposure. CONSTITUTION: A film flattening apparatus 20 which hermetically holds a light transmitting special film coated with a thin film formed of material colored by irradiation with ultraviolet rays is placed on a Zθtable 3, the light transmitting specific film is flattened by evacuation with a vacuum chuck mechanism 26, and a state of exposure is evaluated by observing the density distribution of a pattern which is formed on the specific film by coloring.</p>
申请公布号 JPH08195342(A) 申请公布日期 1996.07.30
申请号 JP19950005972 申请日期 1995.01.18
申请人 TOSHIBA CORP 发明人 ENAMI TATSUO
分类号 G03B27/20;G03F7/20;G03F7/207;H01L21/027;H01L21/66;H01L21/68;H01L21/683;(IPC1-7):H01L21/027 主分类号 G03B27/20
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