首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PATTERN FORMING METHOD
摘要
申请公布号
JPH02109330(A)
申请公布日期
1990.04.23
申请号
JP19880261945
申请日期
1988.10.18
申请人
FUJITSU LTD
发明人
TANAKA HIROYUKI
分类号
H01L21/302;H01L21/3065
主分类号
H01L21/302
代理机构
代理人
主权项
地址
您可能感兴趣的专利
SEMICONDUCTOR INTEGRATED CIRCUIT AND LAYOUT METHOD THEREOF
BIPOLAR TRANSISTOR AND MANUFACTURING METHOD
FORMATION OF AL BASED WIRING
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND FABRICATION THEREOF
DEPOSITION OF THIN FILM
FABRICATION OF SEMICONDUCTOR ELEMENT
METHOD FOR CORRECTING AMOUNT OF DEFLECTION OF ELECTRON BEAM EXPOSURE DEVICE
TEMPERATURE-SENSITIVE POLYMER MATERIAL AND TEMPERATURE SENSOR
PLASMA TREATMENT DEVICE
BURYING METHOD FOR DEEP BURIED EARTH/MESH EARTH ELECTRODE MATERIAL
CONNECTING METHOD FOR ELECTRIC WIRES CONSTITUTING WIRE HARNESS
TERMINAL METAL CORRECTING JIG FOR CONNECTOR AND CONNECTOR INSPECTION DEVICE WITH IT
PARALLEL SCAN TYPE ION IMPLANTATION DEVICE
ASTIGMATISM CORRECTING METHOD AND DEVICE FOR SCANNING TYPE CHARGED PARTICLE BEAM MICROSCOPE OR THE LIKE
OPERATING MECHANISM OF CIRCUIT BREAKER
LEVER SWITCH DEVICE
MANUFACTURE OF FLAT CABLE
GLOBE FRAME STRUCTURAL MEMBER
SEMICONDUCTOR INTEGRATED CIRCUIT MEMORY DEVICE
ELECTRONIC EQUIPMENT