| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a wafer transportation apparatus which can prevent such pollution substance as quartz particle remaining on a quartz board from scattering therefrom, depositing on a wafer and polluting it. SOLUTION: Upon transporting a wafer 10, charging or discharging it to or from a quartz board 30 in steps of manufacturing a semiconductor element, for the purpose of preventing such pollution substance as particle from being generated on the quartz board 30 and from polluting the wafer 10, a chuck assembly 1 of the wafer transportation assembly includes a pair of wafer guides 21a and 21b having a plurality of slots and disposed at least both side ends of the wafer 10 to grasp and transport the wafer 10. Provided in the slots are nozzles 24 for gas ejection, which eject gas from the nozzles 24 to the quartz board 30 when it is desired to charge or discharge the wafer 10, thus enabling removal of pollution substance on the quartz board 30.</p> |
