| 摘要 |
PROBLEM TO BE SOLVED: To obtain high accuracy and long lifetime of a transfer pattern of a necessary desired shape by providing a base material having a transfer molding surface of a predetermined shape formed by dry etching, and a release film formed on the material, and forming a surface of the film as a transfer molding surface. SOLUTION: A mold material 1 made of superhard raw material containing tungsten carbide is prepared. This one surface is coated with positive photoresist by a spin coating method to form a resist film 2. A photomask of a predetermined shape is brought into close contact with an upper surface of the film, emitted with ultraviolet ray to form a resist pattern 3. After it is postbaked, with the patterns 3 as masks the one surface of the material is dry etched. The pattern 3 is released by using releasing liquid to form a base material 4. Here, a side formed with grooves 4a becomes a transfer molding elementary surface 5, and a release film 6 is formed on the surface by using an RF sputtering unit. |
