发明名称 METHOD AND DEVICE FOR WASHING PATTERN MASK FOR PRINTING
摘要 PROBLEM TO BE SOLVED: To provide a method and device which can remove residue of a printing paste or the like easily at a low cost even when the hole shape of a pattern mask becomes minute. SOLUTION: A pattern mask for printing is made one electrode in an electrolytic cleaning liquid, and the other electrode is provided in a manner to be confronted with the first electrode. While a voltage is applied between both electrodes, the electrolytic cleaning liquid is fed to the pattern mask for printing by this washing method and device of the pattern mark for printing. The other electrode works as a jetting nozzle as well for the feeding of the electrolytic cleaning liquid. Also, a plurality of electrolytic cleaning liquid feeding ports are provided in parallel in the place of the jetting nozzle, and the surface of the pattern mask for printing is scrolled by the feeding ports. In addition, the pattern mask for printing is made a cathode, the other electrode is made an anode, and an anode is separately formed on the side wherein the pattern mask for printing is pinched. In the meantime, an independently divided anode is respectively provided on the plurality of electrolytic cleaning liquid feeding ports. Then, the divided anodes are confronted with the pattern mask for printing of the cathode.
申请公布号 JP2002086691(A) 申请公布日期 2002.03.26
申请号 JP20000279093 申请日期 2000.09.14
申请人 DENRYO GIKEN KK 发明人 WADA YOICHI;TANAKA EIICHI;ARAKI TETSUYA
分类号 B41F35/00;B08B3/10;B08B7/00;H05K3/34;(IPC1-7):B41F35/00 主分类号 B41F35/00
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