发明名称 VALVE FOR PHOTOSENSITIVE MATERIAL PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a valve for a photosensitive material processing device which is capable of preventing the occurrence of liquid leakage and preventing the erroneous insertion of a filter when the valve is operated to a supply state of supplying prescribed liquid containing water into a processing vessel by a pump, etc., and a non-supply state for attaching and detaching the filter for filtering foreign matter. SOLUTION: This valve has a main body 33 which has a chamber 34 communicated with an introducing port member 36 connected to a water tank and a discharge port member 38 connected to a bellows pump, a valve member 42 which has a through-hole 43 for putting the valve into the supply state and is disposed in a liquid tight state by packings 40 and 41 in the chamber 34 and is moved in parallel to the positions of the supply state and the non-supply state, and the filter 50 which is made attachable and detachable into and from the through-hole 43 while the erroneous insertion is prevented.
申请公布号 JP2002049138(A) 申请公布日期 2002.02.15
申请号 JP20000236068 申请日期 2000.08.03
申请人 NIDEC COPAL CORP 发明人 OIKAWA YOSHINORI
分类号 G03D3/06;(IPC1-7):G03D3/06 主分类号 G03D3/06
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