发明名称 METHOD AND DEVICE FOR PLASMA TREATMENT OF SUBSTRATES
摘要 A device for bombarding at least one substrate with a plasma with a first electrode fiend a second electrode that can be arranged opposite thereto, which electrodes are formed together producing the plasma between the electrodes wherein at least one of the electrodes is formed from at least two electrode units. In addition, this invention relates to a corresponding method.
申请公布号 SG11201608771W(A) 申请公布日期 2016.11.29
申请号 SG11201608771W 申请日期 2014.05.09
申请人 EV GROUP E. THALLNER GMBH 发明人 GLINSNER, THOMAS;FLÖTGEN, CHRISTOPH;BERNAUER, JOHANN;WAGENLEITNER, THOMAS;WIESER, THOMAS;SCHMID, FLORIAN;PLACH, THOMAS;ANZENGRUBER, ROMAN;NONES, ALEXANDER;KRIEBISCH, UWE
分类号 H01J37/32;H01L21/687 主分类号 H01J37/32
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