| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an imprint mold having a fine uneven pattern of high accuracy on one side of a base material, having a portion of different thickness in the plane, by dry etching using plasma, and to provide a base material for use in the manufacture of the imprint mold.SOLUTION: In a method of manufacturing an imprint mold by using a base material 10 having a first side 10a, and a second side 10b facing the first side, and including a first dielectric having a dent 13 formed on the second side, a support structure for supporting a dielectric constant adjustment member 30 from the second side is formed in the base material, and a fine uneven pattern 2 is formed on the first side of the base material, after arranging the dielectric constant adjustment member including a second dielectric in the dent of the base material. |
