发明名称 Conduction layer for stacked CIS charging prevention
摘要 A semiconductor device includes a first semiconductor chip comprising a first metallic structure and a second semiconductor chip comprising a second metallic structure. The second semiconductor chip is bonded with the first semiconductor chip by a first conductive plug. A second conductive plug extends from the first metallic structure and into a substrate of the first semiconductor chip. The first conductive plug connects the first metallic structure and the second metallic structure, wherein a conductive liner is along a sidewall of the first conductive plug or the second conductive plug.
申请公布号 US9559135(B2) 申请公布日期 2017.01.31
申请号 US201414464035 申请日期 2014.08.20
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. 发明人 Li Cheng-Yuan;Lin Kun-Huei;Chou Chun-Hao;Lee Kuo-Cheng;Hsu Yung-Lung
分类号 H01L23/48;H01L27/146;H01L31/18;H01L31/02 主分类号 H01L23/48
代理机构 WPAT, P.C., Intellectual Property Attorneys 代理人 WPAT, P.C., Intellectual Property Attorneys ;King Anthony
主权项 1. A semiconductor device, comprising: a first semiconductor chip comprising: a first surface;a second surface opposite to the first surface;a substrate between the first surface and the second surface; anda first metallic structure above the first surface and electrically connected to the substrate; a second semiconductor chip comprising a second metallic structure and bonded with the first semiconductor chip on the second surface; a first conductive plug extending from the first semiconductor chip to the second semiconductor chip, and landing on the second metallic structure; a second conductive plug extending from the first metallic structure and into the substrate; and a conductive liner only along a portion of a sidewall of the first conductive plug surrounded by the substrate.
地址 Hsinchu TW