发明名称 |
Conduction layer for stacked CIS charging prevention |
摘要 |
A semiconductor device includes a first semiconductor chip comprising a first metallic structure and a second semiconductor chip comprising a second metallic structure. The second semiconductor chip is bonded with the first semiconductor chip by a first conductive plug. A second conductive plug extends from the first metallic structure and into a substrate of the first semiconductor chip. The first conductive plug connects the first metallic structure and the second metallic structure, wherein a conductive liner is along a sidewall of the first conductive plug or the second conductive plug. |
申请公布号 |
US9559135(B2) |
申请公布日期 |
2017.01.31 |
申请号 |
US201414464035 |
申请日期 |
2014.08.20 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
发明人 |
Li Cheng-Yuan;Lin Kun-Huei;Chou Chun-Hao;Lee Kuo-Cheng;Hsu Yung-Lung |
分类号 |
H01L23/48;H01L27/146;H01L31/18;H01L31/02 |
主分类号 |
H01L23/48 |
代理机构 |
WPAT, P.C., Intellectual Property Attorneys |
代理人 |
WPAT, P.C., Intellectual Property Attorneys ;King Anthony |
主权项 |
1. A semiconductor device, comprising:
a first semiconductor chip comprising:
a first surface;a second surface opposite to the first surface;a substrate between the first surface and the second surface; anda first metallic structure above the first surface and electrically connected to the substrate; a second semiconductor chip comprising a second metallic structure and bonded with the first semiconductor chip on the second surface; a first conductive plug extending from the first semiconductor chip to the second semiconductor chip, and landing on the second metallic structure; a second conductive plug extending from the first metallic structure and into the substrate; and a conductive liner only along a portion of a sidewall of the first conductive plug surrounded by the substrate. |
地址 |
Hsinchu TW |