| 主权项 |
1. An etching material comprising:
(i) at least one boron compound selected from a group consisting of a Lewis acid that comprises, in a structure of the Lewis acid, boron and a halogen that is bonded to the boron, a salt of the Lewis acid, and a compound that generates the Lewis acid; and (ii) a compound that is a non-volatile liquid at 250° C. and dissolves the boron compound, wherein the boron compound has a melting point of 250° C. or lower and is non-volatile, and wherein the boron compound is one or more selected from the group consisting of triphenylcarbenium tetrafluoroborate, tetrafluoroborate tropylium, tetrafluoroborate-di-n-butylammonium, tetrafluoroborate trimethyloxonium, tetrafluoroborate triethyloxonium, 1-ethyl-2,3-dimethylimidazolium tetrafluoroborate, 1-butyl-1-methylpyrrolidinium tetrafluoroborate, potassium methyltrifluoroborate, potassium 4-iodophenyltrifluoroborate, potassium (4-methyl-1-piperadinyl)methyltrifluoroborate, tricyclopentylphosphine tetrafluoroborate, boron trifluoride monoethylamine complex, potassium pyridine-3-trifluoroborate, nitronium tetrafluoroborate, boron triiodide, tris(pentafluorophenyl)boran, and lithium tetrakis(pentafluorophenyl)borate ethyl ether complex. |
