Cross section processing method and cross section processing apparatus

摘要

A cross section processing method and a cross section processing apparatus are provided in which it is possible to form a flat cross section in a sample composed of a plurality of substances having different hardness by a focused ion beam. The etching of a processing area is performed while variably controlling the irradiation interval, the irradiation time, or the like of a focused ion beam based on cross section information of an SEM image obtained by the observation of a cross section. In this way, even if a sample is composed of a plurality of substances having different hardness, it is possible to form a flat observation surface with a uniform etching rate.

主权项

1. A cross section processing method of performing processing of a cross section of a sample by irradiating the sample with a focused ion beam, the method comprising:
forming a processing groove having a slope shape, in which a depth from a surface of the sample gradually increases as it advances in a processing direction, by etching by applying the focused ion beam to a vicinity of a formation planned position of an observation surface of the sample; slicing a processing area of the sample at a slice interval along the processing direction by etching by applying the focused ion beam to a cross section of the processing groove; obtaining cross section information of a cross section after the slicing; and etching the cross section after the slicing; by scanning the focused ion beam in a scanning direction while varying the density of an irradiation amount of the focused ion beam along the scanning direction, based on an etching rate map of the obtained cross section information of the cross section after the slicing, so as to form a substantially flat cross section.