发明名称 |
Mask Pellicle Indicator for Haze Prevention |
摘要 |
A pellicle mask assembly includes a mask, a pellicle frame, and a pellicle membrane. The pellicle frame has a bottom side attached to the mask, and a top side covered by the pellicle membrane. The pellicle frame includes a coating on its inner surface and the coating is configured to monitor a change of environment inside the pellicle mask assembly. In embodiments, the change of environment includes increased humidity and/or increased chemical ion density inside the pellicle mask assembly. Methods of making and using the pellicle mask assembly are also disclosed. |
申请公布号 |
US2017003585(A1) |
申请公布日期 |
2017.01.05 |
申请号 |
US201514754902 |
申请日期 |
2015.06.30 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Lin Kuan-Wen;Chin Sheng-Chi;Hsu Ting-Hao;Chou Tzu-Ting;Wu Shu-Hsien |
分类号 |
G03F1/64 |
主分类号 |
G03F1/64 |
代理机构 |
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代理人 |
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主权项 |
1. An apparatus in semiconductor manufacturing, comprising:
a mask; a pellicle frame having a bottom side and a top side, wherein the bottom side is attached to the mask; and a pellicle membrane covering the top side of the pellicle frame, wherein the mask, the pellicle frame, and the pellicle membrane form a mask assembly, and wherein the pellicle frame includes a coating on its inner surface and the coating is configured to monitor a change of environment inside the mask assembly. |
地址 |
Hsin-Chu TW |