发明名称 Mask Pellicle Indicator for Haze Prevention
摘要 A pellicle mask assembly includes a mask, a pellicle frame, and a pellicle membrane. The pellicle frame has a bottom side attached to the mask, and a top side covered by the pellicle membrane. The pellicle frame includes a coating on its inner surface and the coating is configured to monitor a change of environment inside the pellicle mask assembly. In embodiments, the change of environment includes increased humidity and/or increased chemical ion density inside the pellicle mask assembly. Methods of making and using the pellicle mask assembly are also disclosed.
申请公布号 US2017003585(A1) 申请公布日期 2017.01.05
申请号 US201514754902 申请日期 2015.06.30
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Lin Kuan-Wen;Chin Sheng-Chi;Hsu Ting-Hao;Chou Tzu-Ting;Wu Shu-Hsien
分类号 G03F1/64 主分类号 G03F1/64
代理机构 代理人
主权项 1. An apparatus in semiconductor manufacturing, comprising: a mask; a pellicle frame having a bottom side and a top side, wherein the bottom side is attached to the mask; and a pellicle membrane covering the top side of the pellicle frame, wherein the mask, the pellicle frame, and the pellicle membrane form a mask assembly, and wherein the pellicle frame includes a coating on its inner surface and the coating is configured to monitor a change of environment inside the mask assembly.
地址 Hsin-Chu TW