发明名称 MEMS structures and methods for forming the same
摘要 A method includes forming a MEMS device, forming a bond layer adjacent the MEMS device, and forming a protection layer over the bond layer. The steps of forming the bond layer and the protection layer include in-situ deposition of the bond layer and the protection layer.
申请公布号 US9533876(B2) 申请公布日期 2017.01.03
申请号 US201514731823 申请日期 2015.06.05
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Liu Ping-Yin;Huang Xin-Hua;Huang Hsin-Ting;Hsieh Yuan-Chih;Peng Jung-Huei;Chao Lan-Lin;Tsai Chia-Shiung;Cheng Chun-Wen
分类号 H01L29/84;B81B7/00;H01L49/02;B81C1/00;H01G5/16;B81B3/00 主分类号 H01L29/84
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. A device comprising: a substrate; a micro-electro-mechanical system (MEMS) device over the substrate, wherein the MEMS device comprises: a movable element as a first capacitor plate of a capacitor; anda fixed element as a second capacitor plate of the capacitor; a bond ring encircling the MEMS device, wherein the bond ring comprises a metal; and a protection layer over the bond ring, wherein the protection layer is capable of forming a eutectic metal with the bond ring.
地址 Hsin-Chu TW