| 摘要 |
PROBLEM TO BE SOLVED: To achieve a charged particle beam generation device capable of stably supplying a beam, reducing contamination of an ion source and such caused by an ion beam, reducing complex periodic inspection items.SOLUTION: An extraction power source 2 is on-off controlled in accordance with a state of a synchrotron 10. The control is performed so as not to extract an ion beam from an ion source 1. Thereby, a charged particle beam generation device capable of reducing contamination of the ion source and such caused by the ion beam, reducing complex periodic inspection items can be achieved. A timing at which the extraction voltage is switched from off to on is determined by considering removal of contaminant adhered to inside an ion source system, reduction of discharge inside a linear accelerator before beam emission request, and a time it takes for the beam optical system to reach a predetermined voltage.SELECTED DRAWING: Figure 1 |
