| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film which can be stably formed without mixing high pressure method low density polyethylene, and has excellent blocking resistance without adding an antiblocking agent. <P>SOLUTION: A film is used which comprises an ethylene-based polymer satisfying following requirements (A)-(H) and satisfies following rquirements (I)-(J). (A) A density is 910-940 kg/m<SP POS="POST">3</SP>. (B) An MFR (Melt Mass Flow Rate) is 0.1-20 g/10 min. (C) Terminal vinyl groups are ≤0.2 per 1,000 carbon number. (D) A melt tension [MS<SB POS="POST">160</SB>(mN)] at 160°C is 40-150. (E) Relationship between the MS<SB POS="POST">160</SB>and Ms<SB POS="POST">190</SB>of a melt tension at 190°C is Ms<SB POS="POST">160</SB>/MS<SB POS="POST">190</SB><1.8. (F) An active energy of fluid is ≥30 kJ/mol and <50 kJ/mol. (G) An elution tempreatuer-elution quantity curve obtained by a temperature rising elution fractionation has a plurality of peaks. (H) (Mz/Mw)/(Mw/Mn) is larger than 0.9. (I) A haze is ≥20%. (J) The film does not contain silica, talk, zeolite, mica, carbon, calcium carbonate and magnesium carbonate. <P>COPYRIGHT: (C)2013,JPO&INPIT |
