MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK, AND METHOD FOR MANUFACTURING TRANSFER MASK

摘要

PROBLEM TO BE SOLVED: To provide a mask blank that hardly leaves foreign substances derived from a resist film and has few foreign substance defects when developed, and a transfer mask excellent in pattern accuracy.SOLUTION: The mask blank includes, on substrate: a thin film to form a transfer pattern; a resist underlay film disposed on the above thin film and formed of a resist underlay composition comprising a polymer containing a unit structure having a lactone ring and a unit structure having a hydroxyl group; a resist film disposed on the resist underlay film and formed of a resist composition; and a mixture film disposed to intervene between the resist underlay film and the resist film and formed of a mixture component containing the resist underlay composition and the resist composition.SELECTED DRAWING: Figure 1