发明名称 CHARGED PARTICLE BEAM DEVICE, ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD
摘要 Provided is an electron microscope with which a sample can be observed stably and with high accuracy. The electron microscope comprises: a sample stage; an electron optical system that scans an electron beam over a sample (111); a vacuum system that maintains the sample stage and the electron optical system in a vacuum; a secondary electron detector (109) that detects secondary electrons emitted from the sample; transmitted electron detectors (113, 116) that detect transmitted electrons that have transmitted through the sample; and a control device (117) that obtains a secondary electron image and a transmitted electron image on the basis of the secondary electrons and the transmitted electrons detected by the secondary electron detector and the transmitted electron detectors and stores the secondary electron image and the transmitted electron image. The sample stage is provided with cooling means (122, 123) for cooling the sample. The vacuum system is provided with a cold trap (120) that sucks moisture from around the sample and a vacuum gauge (121) that measures the degree of vacuum of the vacuum system.
申请公布号 WO2016056096(A1) 申请公布日期 2016.04.14
申请号 WO2014JP77034 申请日期 2014.10.09
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SUNAOSHI TAKESHI;NAGAKUBO YASUHIRA;NIMURA KAZUTAKA
分类号 H01J37/20;H01J37/28 主分类号 H01J37/20
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