| 发明名称 | Marking apparatus and marking method | ||
| 摘要 | In accordance with an embodiment, a marking apparatus includes a charged particle beam device and a marking unit. The charged particle beam device generates a charged particle beam, irradiates a sample including a laminated body with the charged particle beam, detects secondary charged particles generated from the sample, and acquires a sample image. The marking unit bores a hole reaching at least a second layer from a surface layer in the laminated body in a viewing field of the charged particle beam device. | ||
| 申请公布号 | US9305743(B2) | 申请公布日期 | 2016.04.05 |
| 申请号 | US201414482520 | 申请日期 | 2014.09.10 |
| 申请人 | KABUSHIKI KAISHA TOSHIBA | 发明人 | Nakai Takehiro;Shuto Hideki |
| 分类号 | B25H7/04;B25H7/00;H01J37/22 | 主分类号 | B25H7/04 |
| 代理机构 | Oblon, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A marking apparatus comprising: a charged particle beam device configured to generate a charged particle beam, irradiate a sample comprising a laminated body with the charged particle beam, detect secondary charged particles generated from the sample, and acquire a sample image; and a marking unit configured to form a hole which reaches at least a second layer from a surface layer in the laminated body in an observation viewing field of the sample provided by the charged particle beam device. | ||
| 地址 | Minato-ku JP | ||