ARTIFICIAL NAIL REMOVAL METHOD, ARTIFICIAL NAIL COMPOSITION, ARTIFICIAL NAIL, ARTIFICIAL NAIL FORMING METHOD, AND NAIL ART KIT

摘要

An object of the invention is to provide an artificial nail removal method by which the burden on the fingertip or nail is reduced without compromising the merit of the glossiness of nail decorations, and without using acetone at the time of removal. Another object of the invention is to provide a nail art kit and an artificial nail composition that are used for the artificial nail removal method, and an artificial nail that uses the artificial nail composition.;Disclosed is an artificial nail removal method including a step of applying an artificial nail composition on or above the nail of a human being or an animal, or on or above a support to form a coating film; a step of drying and/or exposing to light the coating film, and thereby forming an artificial nail; and a removal step of removing the artificial nail by bringing the artificial nail into contact with a removal liquid, in which the artificial nail composition includes (Component A) a compound having an ethylenically unsaturated group and an acid group, and/or (Component B) a polymer having an acid group, and the removal liquid is an aqueous solution having a pH of from 8 to 11.

主权项

1. An artificial nail removal method comprising:
a step of applying an artificial nail composition on or above the nail of a human being or an animal, or on or above a support to form a coating film; a step of exposing to light the coating film, and thereby forming an artificial nail; and a removal step of removing the artificial nail by bringing the artificial nail into contact with a removal liquid, wherein the artificial nail composition includes: (Component A) a compound having an ethylenically unsaturated group and an acid group, and/or (Component C) a polymerizable compound that does not have an acid group; (Component B) a polymer having an acid group; and (Component D) a photopolymerization initiator, Component B is an acrylic polymer containing a monomer unit represented by the following Formula (2) or a urethane polymer having a carboxylic acid group, and the removal liquid is an aqueous solution having a pH of from 8 to 11, wherein in Formula (2), R2 represents a hydrogen atom, a methyl group, or —CH2Y1; Y1 represents a hydroxyl group, a halogeno group, —OC(═O)R3, or —NR3C(═O)R4; X1 represents —O— or —NR3—; R3 and R4 each represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or an aryl group having 6 to 12 carbon atoms; and L1 represents a divalent linking group.