发明名称 BOARD PROCESSING METHOD, PROGRAM, COMPUTE STORAGE MEDIUM, AND BOARD PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a board processing method, a program, a computer storage medium, and a board processing system that inactivate acid in resist before development processing, thereby properly performing development processing, and form a resist pattern of a desired dimension.SOLUTION: A board processing method for processing a board comprises: a resist film forming step (step S1) for forming a resist film on a board; an exposure step (step S2) for performing pattern exposure on the resist film on the board; a PEB processing step (step S3) for heating the board after the exposure step and performing deprotection on the resist film with acid in the resist film; an acid inactivating step (step S4) for supplying at least one of vapor and mist of alkaline solution to the resist film on the board after the PEB processing step to inactivate the acid in the resist film; and a development processing step (step S6) for supplying the board with development liquid after the acid inactivating step and performing development processing of the resist film.SELECTED DRAWING: Figure 5
申请公布号 JP2016035956(A) 申请公布日期 2016.03.17
申请号 JP20140157705 申请日期 2014.08.01
申请人 TOKYO ELECTRON LTD 发明人 TSURUTA TOYOHISA;IZEKI TOSHIHIRO;YOSHIHARA KOSUKE
分类号 H01L21/027;G03F7/38 主分类号 H01L21/027
代理机构 代理人
主权项
地址