| 发明名称 |
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
A resist composition include (A1) a resin which includes a structural unit represented by formula (a4), and which resin has neither an acid-labile group nor an aromatic ring, (A2) a resin having an acid-labile group, and an acid generator,;;wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group; and a structural unit having a ketone group. |
| 申请公布号 |
US2016077429(A1) |
申请公布日期 |
2016.03.17 |
| 申请号 |
US201514854830 |
申请日期 |
2015.09.15 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MASUYAMA Tatsuro;SUZUKI Yuki;ICHIKAWA Koji |
| 分类号 |
G03F7/038;G03F7/20;C08F220/22;G03F7/32;C08F220/10;G03F7/16;G03F7/38 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A resist composition comprising
(A1) a resin which comprises a structural unit represented by formula (a4): wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group; and a structural unit having a ketone group, and the resin has neither an acid-labile group nor an aromatic ring, (A2) a resin having an acid-labile group, and an acid generator. |
| 地址 |
Tokyo JP |
