发明名称 OPTICAL MASK
摘要 According to the present invention, provided is an optical mask comprising a photothermal conversion pattern layer patterned into high/low absorption areas. More specifically, a heat absorption profile of the photothermal conversion pattern layer can be improved from a Gaussian profile to a rectangular profile as the low absorption areas are arranged between the high absorption areas. The optical mask comprises: a light-transmissive base substrate; a reflection pattern layer formed on one surface of the light-transmissive base substrate; and the photothermal conversion pattern layer formed on the reflection pattern layer.
申请公布号 KR20160028598(A) 申请公布日期 2016.03.14
申请号 KR20140117103 申请日期 2014.09.03
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 LEE, YEON HWA;LEE, JOON GU;CHOI, JIN BAEK
分类号 H01L51/56;H01L21/027 主分类号 H01L51/56
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