| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having good CD (critical dimension) uniformity can be produced.SOLUTION: The resist composition includes: (A) a resin having a structural unit expressed by formula (I), which is insoluble or poorly soluble with an alkali aqueous solution and can dissolve in an alkali aqueous solution by the action of an acid; (B) an acid generator; and (D) a compound expressed by formula (II). In the formulae, ring Trepresents a sultone ring optionally having a substituent; Zrepresents an alkane diyl group optionally having a substituent, or the like; Zrepresents a single bond or a carbonyl group; Rrepresents an alkyl group optionally having a halogen atom, a hydrogen atom or a halogen atom; Rand Reach represent a hydrocarbon group, an alkoxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, a nitro group or a halogen atom; m and n each represent an integer of 0 to 4. |
