MODELING PATTERN DEPENDENT EFFECTS FOR A 3-D VIRTUAL SEMICONDUCTOR FABRICATION ENVIRONMENT
摘要
<p>A mechanism for identifying and modeling pattern dependent effects of processes in a 3-D Virtual Semiconductor Fabrication Environment is discussed.</p>
申请公布号
WO2015112979(A9)
申请公布日期
2016.01.14
申请号
WO2015US12911
申请日期
2015.01.26
申请人
COVENTOR, INC.;GREINER, KENNETH, B.;FRIED, DAVID, M.;KAMON, MATTAN;FAKEN, DANIEL
发明人
GREINER, KENNETH, B.;FRIED, DAVID, M.;KAMON, MATTAN;FAKEN, DANIEL
