| 摘要 |
A UV system (100) for irradiating a substrate includes a RF source (102) capable of generating RF energy, a UV lamp (105) capable of emitting UV energy when excited by the RF energy generated by the RF source, and a monitor (114) coupled to the RF source. The monitor includes data relating to the RF source. The UV system further includes a controller (116) capable of communication with the monitor, and the controller determines if the RF source is suitable for operation with the UV system based on the data of the monitor and/or has reached the end of its useful life. |
