LOCALIZED STRESS MODULATION FOR OVERLAY AND EPE

摘要

Embodiments of the disclosure provide apparatus and methods for localized stress modulation for overlay and edge placement error (EPE) using electron or ion implantation. In one embodiment, a process for correcting overlay error on a substrate generally includes performing a measurement process in a metrology tool on a substrate to obtain a substrate distortion or an overlay error map, determining doping parameters to correct overlay error or substrate distortion based on the overlay error map, and providing a doping recipe to a doping apparatus based on the doping parameters determined to correct substrate distortion or overlay error. Embodiments may also provide performing a doping treatment process on the substrate using the determined doping repair recipe, for example, by comparing the overlay error map or substrate distortion with a database library stored in a computing system.

主权项

1. A method for correcting overlay error on a substrate comprising:
performing a measurement process in a metrology tool on a substrate to obtain a substrate distortion map or an overlay error map; determining doping parameters to correct overlay error or substrate distortion based on the substrate distortion map or the overlay error map; and providing a doping recipe to a doping apparatus based on the doping parameters determined to correct substrate distortion or overlay error.