发明名称 EVALUATION METHOD OF DEVICE LAYER STRUCTURE DESIGN FOR LIGHT EMITTING DEVICE, EVALUATION APPARATUS AND LIGHT EMITTING DEVICE
摘要 <p>It is an object to carry out the evaluation of projection light from a light emitting device including a thin film stacked structure of not less than four layers including a light emitting layer in a short time in comparison with a time of a conventional method. An evaluation method of a device layer structure design for a light emitting device, which is that of projection light from a light emitting device containing a thin film stacked structure of not less than four layers including a light emitting layer by means of an information processing apparatus, includes an input step (S01) of inputting information indicative of parameters of the thin films to compose the light emitting device and a spectrum of light emitted from the light emitting layer, a spectrum calculating step (S02) of generating information indicative of the light emitting device divided in a mesh only in the stacked direction of the thin films on the basis of the input parameters, using the generated information and the information indicative of the spectrum of the light emitted from the light emitting layer, and calculating the spectrum of the projection light by an FDTD method, and a spectrum information output step (S03) of outputting information indicative of the calculated projection light spectrum.</p>
申请公布号 WO2009013970(A1) 申请公布日期 2009.01.29
申请号 WO2008JP61626 申请日期 2008.06.26
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED;SAKANO, FUMIHIRO 发明人 SAKANO, FUMIHIRO
分类号 H05B33/10;H01L51/50;H05B33/14 主分类号 H05B33/10
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