| 摘要 |
Embodiments of the present disclosure generally relate to an improved retention and insulation features for lamps used as a source of heat radiation in a thermal processing chamber. In one embodiment, a process chamber is provided. The process chamber includes a lamp assembly for thermal processing of semiconductor substrates, the lamp assembly has a lamp electrical connector and a first laterally operative element, a lamp assembly housing having a passage for receiving the lamp assembly, a power distribution assembly having a receptacle for receiving the lamp electrical connector and delivering power to the lamp electrical connector, and a spacer plate disposed between the lamp assembly housing and the power distribution assembly, wherein the spacer plate has a passage contoured to allow passage of the lamp electrical connector therethrough, and the spacer plate has a retention feature configured to engage or disengage the first laterally operative element. |
