发明名称 |
Power amplifier |
摘要 |
A power amplifier includes a semiconductor substrate including transistor cells, a drain electrode for the transistor cells located on the semiconductor substrate, a drain pad located on the semiconductor substrate and connected to the drain electrode, an ion-implanted resistance located in the semiconductor substrate and extending along and in contact with the drain pad, a floating electrode located on the semiconductor substrate and in contact with the ion-implanted resistance, and an output matching circuit located outside the semiconductor substrate. The power amplifier further includes a wire connecting the drain pad to the output matching circuit. |
申请公布号 |
US9203357(B2) |
申请公布日期 |
2015.12.01 |
申请号 |
US201213433410 |
申请日期 |
2012.03.29 |
申请人 |
MITSUBISHI ELECTRIC CORPORATION |
发明人 |
Miwa Shinichi;Tsukahara Yoshihiro;Kanaya Ko;Kosaka Naoki |
分类号 |
H01L27/085;H01L23/66;H03F1/56;H01L27/02;H01L27/06;H03F3/195;H03F3/21;H03F3/24;H01L23/64;H01L21/8252 |
主分类号 |
H01L27/085 |
代理机构 |
Leydig, Voit & Mayer, Ltd. |
代理人 |
Leydig, Voit & Mayer, Ltd. |
主权项 |
1. A power amplifier comprising:
a semiconductor substrate comprising a plurality of transistor cells; a drain electrode of said plurality of transistor cells located on said semiconductor substrate; a drain pad located on said semiconductor substrate and connected to said drain electrode; a first ion-implanted resistance located in said semiconductor substrate and extending along and in contact with said drain pad; a first floating electrode located on said semiconductor substrate and in contact with said first ion-implanted resistance; an output matching circuit located outside said semiconductor substrate; and a wire connecting said drain pad to said output matching circuit. |
地址 |
Tokyo JP |