| 发明名称 |
SUBSTRATE LIQUID TREATMENT APPARATUS, METHOD OF CLEANING SUBSTRATE LIQUID TREATMENT APPARATUS AND NON-TRANSITORY STORAGE MEDIUM |
| 摘要 |
A substrate liquid treatment apparatus includes: at least one processing unit that processes a substrate with a treatment liquid; a storage tank that stores the treatment liquid; a circulation line through which the treatment liquid discharged from the storage tank into the circulation line is returned to the storage tank; a branch supply line that is branched from the circulation line to supply the treatment liquid to the processing unit; a recovery line that returns to the storage tank the treatment liquid having been supplied to the substrate in the processing unit; a distribution line connecting the circulation line and the recovery line; and a shutoff valve, provided on the distribution line, that is opened when cleaning of the recovery line is performed. |
| 申请公布号 |
US2015328668(A1) |
申请公布日期 |
2015.11.19 |
| 申请号 |
US201514713275 |
申请日期 |
2015.05.15 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KOYAMA Kazuya;KIYOSE Hiromi;MATSUKI Katsufumi;TAKAHASHI Shuhei;NISHIMURA Hideki;UNO Takashi;MARUYAMA Hirotaka |
| 分类号 |
B08B9/032;H01L21/67 |
主分类号 |
B08B9/032 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate liquid treatment apparatus comprising:
at least one processing unit that processes a substrate with a treatment liquid; a storage tank that stores the treatment liquid; a circulation line through which the treatment liquid discharged from the storage tank into the circulation line is returned to the storage tank; a branch supply line that is branched from the circulation line to supply the treatment liquid to the processing unit; a recovery line that returns to the storage tank the treatment liquid having been supplied to the substrate in the processing unit; a distribution line connecting the circulation line and the recovery line; and a shutoff valve, provided on the distribution line, that is opened when cleaning of the recovery line is performed. |
| 地址 |
Tokyo JP |
