发明名称 High temperature performance capable gallium nitride transistor
摘要 <p>A transistor device capable of high performance at high temperatures. The transistor comprises a gate having a contact layer that contacts the active region. The gate contact layer is made of a material that has a high Schottky barrier when used in conjunction with a particular semiconductor system (e.g., Group-III nitrides) and exhibits decreased degradation when operating at high temperatures. The device may also incorporate a field plate to further increase the operating lifetime of the device.</p>
申请公布号 EP1973163(B2) 申请公布日期 2015.11.18
申请号 EP20080250197 申请日期 2008.01.16
申请人 CREE, INC. 发明人 HEIKMAN, STEN;WU, YIFENG
分类号 H01L29/778;H01L21/335;H01L29/40;H01L29/423 主分类号 H01L29/778
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