APPARATUS, TECHNIQUES, AND TARGET DESIGNS FOR MEASURING SEMICONDUCTOR PARAMETERS

摘要

In one embodiment, apparatus and methods for determining a parameter of a target are disclosed. A target having an imaging structure and a scatterometry structure is provided. An image of the imaging structure is obtained with an imaging channel of a metrology tool. A scatterometry signal is also obtained from the scatterometry structure with a scatterometry channel of the metrology tool. At least one parameter, such as overlay error, of the target is determined based on both the image and the scatterometry signal.

主权项

1. A method of determining a parameter of a target, comprising
proving a target having an imaging structure and a scatterometry structure; obtaining an image of the imaging structure with an imaging channel of a metrology tool; obtaining a scatterometry signal from the scatterometry structure with a scatterometry channel of the metrology tool; and determining at least one parameter of the target based on both the image and the scatterometry signal.