发明名称 MULTILAYER ELECTRONIC STRUCTURE WITH INTEGRAL CONSTRUCTION ELEMENTS
摘要 The present invention relates to a multilayer electronic support structure comprising at least one pair of adjacent feature layers extended in an X-Y plane, separated by a via layer. The via layer comprises a dielectric substance that is interposed between the two adjacent feature layers, and at least one constructional element passing through the dielectric substance between the pair of adjacent feature layers in Z direction perpendicular to the X-Y plane. The constructional element is characterized by having a long dimension in the X-Y plane that is at least three times longer than a short dimension in the X-Y plane, and is fully encapsulated within the dielectric substance to be electrically insulated from surroundings thereof.
申请公布号 KR20150126327(A) 申请公布日期 2015.11.11
申请号 KR20150147745 申请日期 2015.10.23
申请人 ACCESS ADVANCED CHIP CARRIERS AND E-SUBSTRATE SOLUTIONS 发明人 DROR HURWITZ;ALEX HUANG
分类号 H05K3/46;H01L23/00;H01L23/498;H05K1/02 主分类号 H05K3/46
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