PLANARIZATION OF OPTICAL SUBSTRATES

摘要

Planarization of defects in laser mirror and other optical component manufacture is disclosed. The planarization is performed by first depositing a relatively thick planarization layer, then carrying out a sequential deposition and etch process. The technique takes advantage of the non-uniform material removal rate as a function of etchant incident angle, and effectively buries the inclusion in a thick film with a near planar top surface. The process enables faster, more reliable manufacture of a non-defective high fluence multilayer mirror particularly suitable for high energy laser applications.

主权项

1. A method of making an optical component in which a substrate surface has at least a one micron size nodular defect comprising:
depositing a planarization layer over the defect; depositing an ion beam etchable layer over the planarization layer; etching away a portion of the ion beam etchable layer; depositing a layer of a metal oxide over the ion beam etchable layer; and repeating the steps of depositing an ion beam etchable layer, etching away a portion of the ion beam etchable layer, and depositing a layer of metal oxide, until the nodular defect is reduced in size a predetermined amount.