发明名称 FILM DEPOSITION METHOD AND FILM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a film deposition system where, in film deposition by an aerosol deposition process, a film whose thickness and quality are uniform can be deposited. SOLUTION: The film deposition system comprises: an aerosol production part where raw material powder is dispersed into a gas, so as to produce an aerosol; a film deposition chamber 6 where a substrate is arranged; an aerosol carrier tube 5 for carrying the aerosol produced in the aerosol production part to the film deposition chamber; a nozzle 7 arranged in the film deposition chamber and jetting the aerosol carried via the aerosol carrier tube toward the substrate; a substrate stage 8 for moving the position of the nozzle or the substrate for changing the relative position between the nozzle and the substrate; and a control part 10 for controlling each part for interrupting film deposition and cleaning the inside of the aerosol carrier tube. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008088451(A) 申请公布日期 2008.04.17
申请号 JP20060267144 申请日期 2006.09.29
申请人 FUJIFILM CORP 发明人 SHINKAWA TAKAMI
分类号 C23C24/04;B01J19/00;B05B7/14 主分类号 C23C24/04
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