发明名称 |
METHOD FOR DETERMINING EXPOSURE CONDITIONS, EXPOSURE METHOD, EXPOSURE DEVICE, AND APPARATUS FOR PRODUCING DEVICE |
摘要 |
The situation of a liquid immersion region (LR) formed on the surface of a substrate (P) is detected while changing at least one of the movement condition of the substrate (P) and the liquid immersion condition when forming the liquid immersion region (LR), and an exposure condition is determined based on the detection results. |
申请公布号 |
EP1865539(A1) |
申请公布日期 |
2007.12.12 |
申请号 |
EP20060730623 |
申请日期 |
2006.03.30 |
申请人 |
NIKON CORPORATION |
发明人 |
KIDA, YOSHIKI;NAGASAKA, HIROYUKI |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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